BS IEC 63068-1:2019

BS IEC 63068-1:2019 Semiconductor devices. Non-destructive recognition criteria of defects in silicon carbide homoepitaxial wafer for power devices. Classification of defects

standard by British Standard / International Electrotechnical Commission, 05/10/2019

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Scope: This part of IEC 63068 gives a classification of defects in as-grown 4H-SiC (Silicon Carbide) epitaxial layers. The defects are classified on the basis of their crystallographic structures and recognized by non-destructive detection methods including bright-field OM (optical microscopy), PL (photoluminescence), and XRT (X-ray topography) images.

Cross References:
ISO 15247:2015
ISO 24173


All current amendments available at time of purchase are included with the purchase of this document.

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