BS IEC 63068-2:2019

BS IEC 63068-2:2019 Semiconductor devices. Non-destructive recognition criteria of defects in silicon carbide homoepitaxial wafer for power devices. Test method for defects using optical inspection

standard by British Standard / International Electrotechnical Commission, 02/08/2019

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Full Description

BS IEC 63068-2:2019 provides definitions and guidance in use of optical inspection fordetecting as-grown defects in commercially available 4H-SiC (Silicon Carbide) epitaxialwafers. Additionally, this document exemplifies optical images to enable the detection andcategorization of the defects for SiC homoepitaxial wafers.

Cross References:
ISO 24173


All current amendments available at time of purchase are included with the purchase of this document.

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